A.S Bhattacharyya, P. Prabhakar, R.P. Kumar, S. Sharma, S.K. Raj, R. Ratn, P. Kommu
(Submitted on 17 Nov 2016)
Magnetron sputtering has also been used to deposit thin films of some materials and it has significant technological importance. A modeling on deposition of epitaxial thin films of Yttrium Stabilized Zirconia (YSZ) was done the diffusion of adatom on the surface were studies. There exists a strong interaction of ions formed in the plasma during the sputtering process. Cu thin films were deposited on Si. Nanocomposite thin film of SiCN showed dendritic growth.
https://arxiv.org/abs/1611.07926