Mitsui Mining & Sm (MMSMY) 9.9200 $MMSMY Sputte
Post# of 273242
Sputter Coating Market 2015-2020 - Target Material, Substrate & Application Analysis of the $5.6 Billion Industry
PR Newswire Europe - Tue Nov 10, 7:11AM CST
Research and Markets(http://www.researchandmarkets.com/research/qt7s7n/sputter_coating [http://www.researchandmarkets.com/research/qt7s7n/sputter_coating]) has announced the addition of the "Sputter Coating Market by Target Material (Pure Material, Compound), by Substrate (Metal, Glass, Plastic, Semiconductor), by Application (Architecture, Electronics, Optical, Tribological & Decorative Coating) & by Geography - Global Forecast to 2020" [http://www.researchandmarkets.com/research/qt7s7n/sputter_coating] report to their offering.
HON: 115.28 (+1.25), IVAC: 5.82 (+0.06)
Global and Chinese ITO (Indium Tin Oxide) Sputtering Targets Industry Report 2015
M2 - Mon Sep 07, 6:04AM CDT
Research and Markets (http://www.researchandmarkets.com/research/hgrhvl/global_and) has announced the addition of the "Global and Chinese ITO Sputtering Targets Industry Report, 2014-2017" report to their offering. As one of crucial materials in the field of electronic information, ITO (indium tin oxide) sputtering targets get chiefly utilized to manufacture flat LCD, touch screens, thin film transistors, transparent electrodes of solar cells and multifunctional glass. With the prevalence of smart phones, tablet PCs and other mobile terminals, the global demand for ITO sputtering targets continues to increase, hitting about 1,950 tons in 2014, of which China accounted for about 36%. In 2017, the global demand will approximate 2,700 tons. Although with its huge demand for ITO sputtering targets, China's output was as low as 90 tons in 2014. The ITO sputtering target technology has been mastered by a few companies in Japan and South Korea, while Chinese enterprises have been developing slowly in independent R & D. Subject to technical constraints, the ITO sputtering targets made in China mainly target at the low-end market; whereas, the ITO sputtering targets used for high-end TFT-LCD and touch screens are almost imported from Japan and South Korea. In view of this, Chinese enterprises over the recent years have accelerated R & D and introduction of the ITO sputtering target technology, and launched a number of high-end ITO sputtering target localization projects. Key Topics Covered: 1 Brief Introduction to ITO Sputtering Targets 2 Status Quo of Global ITO Sputtering Targets 3 Status Quo of Chinese ITO Sputtering Targets 4 Upstream - Indium Market 5 Downstream Application Market 6 Global Key ITO Sputtering Target Companies 7 Key Chinese ITO Sputtering Target Enterprises 8 Summary and Forecast Companies Mentioned - Beijing Yeke Corporation - CNMC (Ningxia) Orient Group - Changsha ENAM Optoelectronic Material Co., Ltd. - Changzhou Sujing Electronic Materials Co., Ltd. - Guangdong Triumph Photovoltaic Technology Research Institute Co., Ltd. - Guangxi Crystal Union Photoelectric Materials Co., Ltd. - Hebei Pengda New Material Technical Co., Ltd. - Heraeus - JX Nippon Mining & Metals - Liuzhou China Tin Group - Luoyang Ship Material Research Institute - Mitsui Mining & Smelting Company - SOLAR - Samsung Corning - Shaoguan Sigma Technology Co., Ltd - Tosoh Corporation - Umicore - Weihai Lanhu Special Materials Development Co., Ltd. - Zhuzhou Smelter Group For more information visit http://www.researchandmarkets.com/research/hgrhvl/global_and
Oban Exploration Notes Drill Results at Antamayo and Refocuses on Other Properties
Marketwired - Tue Oct 21, 4:01PM CDT
Oban Mining Corporation ("Oban" or "the Company" (TSX: OBM) announces that it will take steps to formally terminate its option agreement (the "Agreement" with Mitsui Mining & Smelting Co. Ltd ("Mitsui" with respect to the Antamayo property (the "Project" . Pursuant to the Agreement, Oban had the option to acquire a 70% interest in the Project by incurring an aggregate of US$3,000,000 in exploration expenditures and US$1,000,000 in cash. Oban has completed the final drill campaign of nine holes totalling 6,475 m, which did not intersect significant copper mineralization. The diamond drill program identified two wide zones of skarn alteration in two separate areas, thus verifying that the concept of a blind skarn deposit at depth was correct. However, the mineralization in the system encountered was not significant enough for the Company to justify further drilling.
OBM.TO: 2.16 (-0.05)