SUSS MicroTec and NuFlare Technology agree on collaboration
Business Wire - Tue Jan 20, 1:36AM CST
NuFlare Technology, the market leader in electron-beam mask writers and SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, announced today a cooperation to combine their expertise in Photomask Equipment and process solutions. NuFlare Technology will install a SUSS MicroTec MaskTrackPro bake and develop system into their main manufacturing fab, in Yokohama, Japan, in early 2015. The MaskTrackPro system is designed and manufactured to meet the most demanding requirements for masks used in NGL (Next Generation Lithography), such as EUVL (Extreme-Ultraviolet Lithography), 193i extension and NIL (Nano-Imprint Lithography). Since its release by SUSS MicroTec in 2010, more than 30 systems have been shipped to customers worldwide. NuFlare Technology and SUSS MicroTec will jointly work on advanced process solutions, closely integrating the latest NuFlare EB-writer, EBM-9000 and MaskTrackPro.