Exploring E&R's Cutting-Edge Technologies at SEMICON Taiwan
Unveiling Innovations at SEMICON Taiwan 2025
E&R Engineering (TPE: 8027) is set to showcase its latest advancements in laser and plasma technologies at SEMICON Taiwan. As the semiconductor industry rapidly evolves, driven by needs for Artificial Intelligence (AI), High-Performance Computing (HPC), and 5G, advanced packaging has emerged as a vital focus area. Industry reports suggest that the market for advanced packaging solutions is poised to surpass USD 50 billion by 2025, fueled significantly by the growth of fan-out panel-level packaging (FOPLP), projected to increase by more than 15% annually.
Breakthrough Packaging Solutions
At SEMICON Taiwan 2025, taking place in Taipei, E&R will introduce a broad range of laser and plasma solutions, highlighting capabilities in fan-out panel-level packaging, Through-Silicon Via (TSV) applications, and innovative plasma dicing techniques. These integrated technologies are designed to tackle aspects like high I/O density and warpage control, ensuring precise and reliable performance across various manufacturing processes.
Focus on FOPLP
E&R's commitment to FOPLP will be evident through its diverse equipment lineup. This includes state-of-the-art solutions for laser marking, dicing, plasma cleaning, laser debonding, and ABF drilling. The machinery is capable of handling substrates of impressive dimensions, specifically up to 700×700 mm, and is engineered to maintain high productivity even with substrate warpage reaching up to 16 mm.
Advancing Through-Silicon Via Technology
As the trend toward 3D packaging intensifies, TSV has become crucial for achieving high-density integrated circuits. E&R is stepping up to meet this demand, offering advanced via drilling and cleaning technologies that harness both laser and plasma systems. This dual approach ensures the creation of accurate via profiles with minimal defects for dependable interconnects, accommodating a diverse range of wafer sizes and materials.
Innovative Glass Substrate Solutions
The introduction of glass core substrates marks a significant shift in packaging technology. E&R's laser modification techniques boast exceptional performance specifications, achieving greater than 0.9 via circularity, 10:1 aspect ratios, and up to 1,500 vias per second in drilling capabilities. This innovation empowers the production of CoPoS and ABF substrates, driving advancements in high-performance, high-yield manufacturing processes.
Robust Packaging and Process Support
Designed, manufactured, and rigorously tested in Taiwan, E&R's equipment benefits from partnerships with top U.S. and European suppliers, resulting in over 500 units shipped globally. E&R's solutions are already preferred in fields such as FCBGA, FCCSP, fan-out, and wafer-level packaging by leading OSATs and IDMs. Furthermore, a recent expansion of E&R's Flip Chip BGA portfolio includes innovative products like Pre-Flip Chip Die Bond Plasma Cleaning and advanced Laser Marking for enhanced traceability.
Visit E&R at SEMICON Taiwan
As part of its commitment to innovation and collaboration, E&R invites industry partners to visit their booth at SEMICON Taiwan 2025. Attendees will have the opportunity to engage with E&R's technical experts and explore the next generation of advanced packaging and dicing technologies.
- Venue: Taipei Nangang Exhibition Center, Hall 1
- Booth: 4F, #N0968
- Dates: September 10–12, 2025
- Website: E&R Engineering Official Website
Frequently Asked Questions
What technologies will E&R showcase at SEMICON Taiwan 2025?
E&R will showcase laser and plasma solutions, including fan-out panel-level packaging, Through-Silicon Via (TSV), and plasma dicing technologies.
How has the market for advanced packaging technologies changed?
The market for advanced packaging technologies is projected to grow significantly, with estimates exceeding USD 50 billion by 2025, driven by emerging technologies like AI and HPC.
What types of equipment does E&R provide for FOPLP?
E&R provides a complete portfolio for FOPLP, including laser marking, plasma cleaning, laser debonding, and ABF drilling systems.
What is the significance of Through-Silicon Via (TSV) technology?
TSV technology enables high-density integration critical for modern 3D packaging and advanced memory solutions.
Where can attendees learn more about E&R's innovations?
Attendees can visit E&R's booth at SEMICON Taiwan, where they can meet with the technical team to learn more about the latest technologies.
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