Innovative Collaboration Between Curtiss-Wright and Sintavia
In a groundbreaking endeavor, Curtiss-Wright’s EMS Division has announced the successful delivery of the first submarine component incorporating an additively manufactured (AM) impeller destined for a U.S. Navy vessel. This marks a significant leap in advancing defense technologies, showcasing the capabilities of additive manufacturing.
Significance of Additive Manufacturing in Defense
The collaboration between Curtiss-Wright’s Engineered Pump Division (EPD), Bechtel Plant Machinery Inc. (BPMI), and Sintavia, LLC has led to the development of this critical submarine component. Sintavia, known for its excellence in designing and manufacturing defense components, provided a thoroughly qualified AM impeller for this project. The impeller underwent rigorous testing at Curtiss-Wright’s Bethlehem facility.
Benefits of Using Additive Manufacturing
Additive manufacturing technology streamlines the creation of complex components that have traditionally posed manufacturing challenges. This innovative approach not only reduces costs and delays but also ensures higher reliability and quality. By implementing additive manufacturing, the U.S. Navy gains a domestically sourced solution that promises to enhance operational efficiency while mitigating performance risks.
Quotes from Industry Leaders
David Micha, Sr. Vice President and General Manager of the EMS Division stated, “Sintavia has proven to be an invaluable industry partner. We are excited about the opportunity to expand the use of additively manufactured parts for both this project and other essential naval defense components.” This sentiment underscores the growing trust and reliance on cutting-edge manufacturing technologies to support military readiness.
Future Prospects for Additive Manufacturing
Lindsay Lewis, Sintavia’s Corporate Vice President, expressed gratitude for the collaboration, asserting, “Leading-edge manufacturing processes such as AM will continue to be key differentiators in developing superior defense components.” This collaboration enables both companies to enhance their service offerings and support the U.S. Navy’s submarine program.
Company Profiles and Their Contributions
Curtiss-Wright’s EPD has a storied history, having provided pivotal naval technological expertise since 1847. Today, it stands as a leading provider of pumps and components that comply with stringent requirements for both surface and submerged naval fleets. Their commitment includes offering a comprehensive range of services, from spare parts to specialized support.
Sintavia, recognized as the world’s first all-digital component manufacturer for Aerospace & Defense, leads the charge in implementing innovative standards in manufacturing. As a founding member of the Additive Manufacturer Green Trade Association, Sintavia ensures adherence to the highest quality benchmarks in the industry.
Bechtel Plant Machinery, Inc. (BPMI) is integral to the U.S. Naval Nuclear Propulsion Program, focusing on producing high-quality nuclear power plant components essential for submarines and aircraft carriers.
Frequently Asked Questions
What component did Curtiss-Wright and Sintavia deliver?
They delivered the first submarine component featuring an additively manufactured impeller for the U.S. Navy.
What is additive manufacturing?
Additive manufacturing is a process that builds components by adding material layer by layer, often enabling the production of complex designs that were previously difficult or costly to manufacture.
What are the benefits of the new AM technology?
This technology reduces manufacturing lead times, improves quality, and enhances reliability while providing a domestic source for critical components.
Who are the partners involved in this project?
The project involved collaboration among Curtiss-Wright, Sintavia, and Bechtel Plant Machinery Inc. (BPMI).
How long has Curtiss-Wright been in operation?
Curtiss-Wright has been providing naval and maritime technological expertise since 1847, making it a historical leader in the field.
