Beneq Introduces Next-Gen Beneq Transform® XP
Beneq has recently announced the Beneq Transform® XP, a sophisticated second-generation atomic layer deposition (ALD) platform designed to address the evolving demands of Wide Bandgap (WBG) power and RF device manufacturing. This innovative system is poised to redefine atomic control and optimization in ALD processes.
Enhanced Performance and Capabilities
The Beneq Transform® XP marks a significant upgrade over the original Beneq Transform® model. It integrates advanced ALD control mechanisms and boasts enhanced cycle speeds and improved processing capabilities, all tailored for high-efficiency production environments.
With its flow-optimized design, the Transform® XP houses a 25-wafer mini-batch thermal ALD reactor. This reactor achieves remarkable deposition rates with cycle times reduced to single-digit seconds for common oxides and nitrides. Such efficiency ensures remarkable uniformity across wafers, whether measuring within individual wafers or across multiple batches, even at film thicknesses of just a few nanometers.
Features that Revolutionize Device Manufacturing
Among the notable features of the Transform® XP is its enhanced precision in managing low-energy ions through advanced plasma-enhanced ALD (PEALD) control. This innovation allows for optimized pre-cleaning and precise deposition, significantly improving interface quality while ensuring reliable device performance.
The system further includes in-cycle annealing, a proprietary innovation that strengthens and purifies thin films, facilitating the production of stoichiometric materials with low impurities and proper crystalline alignment, such as AlN lattice orientation.
Customer-Centric Innovations
As Dr. Mikko Söderlund, Head of Sales for Semiconductor ALD at Beneq, notes, "Transform® XP is our proactive approach to meet the latest challenges faced in power and RF manufacturing. Customers have appreciated the original Transform® for its versatility and reliability, and with XP, we've included enhancements they have specifically requested: improved ion control, accelerated processing cycles, and integrated film densification—all in one adaptable platform."
Beneq stands as a leader in the ALD field, evidenced by having installed more than a dozen Transform® clusters worldwide, which are utilized in both pilot projects and full production runs. The company has shipped over 100 process modules, demonstrating their commitment to supporting leading Integrated Device Manufacturers (IDMs), foundries, and Research and Technology Organizations (RTOs) in advancing highly technical manufacturing needs beyond traditional methods.
Transforming the Future of ALD Processes
The Beneq Transform® XP is set to play a pivotal role in advancing More-than-Moore technologies by enhancing existing device capabilities and pushing the boundaries of what's possible in power and RF technology development. With its superior architecture and advanced features, this state-of-the-art platform is ready to revolutionize the production landscape for semiconductor devices.
Contact Information
For more details regarding the Beneq Transform® XP, you can contact Charlotte Bärlund, Event and Communications Lead. Beneq is committed to providing the latest advancements in semiconductor manufacturing technology to its clientele.
Frequently Asked Questions
What is the Beneq Transform® XP?
The Beneq Transform® XP is a next-generation ALD platform that enhances performance and capabilities for the production of wide bandgap power and RF devices.
What are the main benefits of the Transform® XP?
It delivers advanced control, faster cycle times, improved ion management, and in-cycle annealing for better device performance and reliability.
How does it improve ALD processes?
The system has enhanced deposition rates, excellent uniformity, and refined control over low-energy ions, optimizing both pre-cleaning and deposition stages.
Who can benefit from the Transform® XP?
Leading Integrated Device Manufacturers, foundries, and R&D organizations focused on advanced semiconductor technologies will find it particularly beneficial.
What makes the Beneq Transform® XP innovative?
It incorporates several proprietary technologies, including advanced PEALD process control and in-cycle annealing, setting a new standard for ALD systems.
